Preparation and characterization of Nickel-doped ZnO nanoparticles thin films by thermal sputtering method
DOI:
https://doi.org/10.56286/r9jaa703Keywords:
ZnO Nanoparticles, thermal sputtering method, XRD, PLAbstract
Thin films of nickel-doped ZnO nanoparticles were deposited on glass substrates by the thermal sputtering method with different doping ratios (0, 0.5, 1, 2, 4) %. From the X-ray diffraction of the prepared samples, it was found that the structure is hexagonal (Wurtzite), the diffraction peak corresponding to the crystal orientation plane (200) appeared at a doping ratio of (4%) only, and this is due to the added nickel ions. Using the UV-Vis absorption spectrum of the prepared films shows an absorption peak for ZnO at λ= 363nm and this peak shifts towards shorter wavelengths with increasing doping ratios. The energy gap of the prepared films was measured, and it was found that it decreases from the doping ratios (0,0.5,1,2) %, which are respectively (3.24, 3.231, 3.227, 3.218 eV), then its value increases again (3.23 eV) at a doping ratio of (4) %. The fluorescence spectrum was measured using λEx =325 nm, it was observed that pure ZnO has a broad fluorescence peak at (357.1nm) and another less intense peak at (371.1nm) with increasing doping ratio, the fluorescence peaks suffer a slight shift towards longer wavelengths.
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